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US 2020/0350140 A1Published application
Apparatus and system for modulated plasma systems
AssigneeAdvanced Energy Industries, Inc.
InventorGideon Van Zyl
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Abstract
Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.
Claims27
A plasma processing system comprising:
- a high-frequency generator configured to deliver power to a plasma chamber;
- a low-frequency generator configured to deliver power to the plasma chamber;
- a filter configured to suppress power mixing products to limit variation of a time-varying load reflection coefficient presented to the high frequency generator;
- and
- a frequency-tuning subsystem configured to adjust a frequency of the high-frequency generator to adjust an impedance presented to the high-frequency generator.
2 more elements
A plasma processing system comprising:
- a high-frequency generator configured to deliver power to a plasma chamber;
- a low-frequency generator configured to deliver power to the plasma chamber;
- a filter coupled between the plasma chamber and the high frequency generator, the filter including two or more helical resonators connected in parallel;
- a time delay element between the filter and the plasma chamber;
- and
- a frequency-tuning subsystem configured to adjust a frequency of the high-frequency generator to adjust an impedance presented to the high-frequency generator.
3 more elements
A filter comprising:
- a first helical resonator;
- a second helical resonator connected in parallel with the first helical resonator, wherein the parallel combination of the first and second helical resonators is configured to couple to a high-frequency generator, and the parallel combination of the first and second helical resonators is configured to couple to a low-frequency generator via a plasma load;
- wherein the parallel combination of the first and second helical resonators is configured to suppress power outside of a bandwidth around a frequency of the high-frequency generator;
- wherein the suppression of power at the frequency of the high-frequency generator is at most 2 dB;
- and
- wherein the suppression of power at frequencies more than the frequency of the low-frequency generator from the frequency of the high-frequency generator is at least 2 dB higher than the suppression of power at the frequency of the high-frequency generator.
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A filter comprising:
- a first helical resonator comprising a first hollow helical coil;
- a second helical resonator comprising a second hollow helical coil, the second helical resonator coupled in parallel with the first helical resonator;
- and
- wherein each hollow helical coil is coupled to a conductive block that includes a water channel to enable water to flow into the first hollow helical coil, through the conductive block, and out the other hollow helical coil.
1 more element
Dependencies are inferred from the claim text.