Systems and methods for reducing resist model prediction errors
AssigneeASML Netherlands B.V.
InventorsMarleen KOOIMAN, David Marie RIO, Sander Frederik WUISTER
Life of this patent
Estimating the term…
Abstract
A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
Claims20
A method of calibrating a resist model, the method comprising:
- generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and one or more parameters of the resist model;
- predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device;
- and
- adjusting one or more parameters of the resist model based on a comparison between the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
A device for calibrating a resist model, the device comprising:
- a processor configured to
- generate a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and one or more parameters of the resist model;
- predict a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device;
- and
- adjust one or more parameters of the resist model based on a comparison between the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
A method comprising:
- generating a modeled resist contour of a resist structure based at least on a simulated aerial image of the resist structure;
- predicting, based on the modeled resist contour, the simulated aerial image, and at least one resist sidewall parameter of a set of resist sidewall parameters associated with the resist structure, a measurement of a portion of a waveform corresponding to an edge of an actual resist structure imaged by a metrology device;
- and
- adjusting the at least one resist sidewall parameter based on a comparison between the predicted measurement of the portion of the waveform and an actual measurement of the portion of the waveform corresponding to the edge of the actual resist structure imaged by the metrology device.
Dependencies are inferred from the claim text.