Semiconductor photoresist composition and method of forming patterns using the composition

A semiconductor photoresist composition, comprising:

• an organometallic compound represented by Chemical Formula 1,
• an organometallic compound represented by Chemical Formula 2, and
• a solvent:
• wherein, in Chemical Formula 1,
• R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group comprising at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethylene oxide group, a propylene oxide group, or any combination thereof,
• X, Y, and Z are each independently —OR1 or —OC(═O)R2,
• R1 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or any combination thereof, and
• R2 is hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or any combination thereof;
• wherein, in Chemical Formula 2,
• X′ is —OR3 or —OC(═O)R4,
• R3 is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or any combination thereof, and
• R4 is hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, a substituted or unsubstituted C2 to C20 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or any combination thereof.