Field-biased second harmonic generation metrology
AssigneeFemtoMetrix, Inc.
InventorsViktor Koldiaev, Marc Kryger, John Changala
Life of this patent
Estimating the term…
Abstract
Various approaches can be used to interrogate a surface such as a surface of a layered semiconductor structure on a semiconductor wafer. Certain approaches employ Second Harmonic Generation and in some cases may utilize pump and probe radiation. Other approaches involve determining current flow from a sample illuminated with radiation. Decay constants can be measured to provide information regarding the sample. Additionally, electric and/or magnetic field biases can be applied to the sample to provide additional information.
Claims14
-57. (canceled)
A system for optically interrogating a surface of a sample while inducing an electric field across at least a portion of said sample, said system comprising:
- a first optical source configured to emit probing radiation, said first optical source disposed so as to direct said probing radiation onto said surface of said sample;
- an optical detector configured to detect second harmonic generated light from the sample;
- and
- processing electronics configured to determine a characteristic of the detected second harmonic generated light,
- wherein said system is configured to produce an electric field across at least a portion of said sample in addition to any electric field produced by said probing radiation.
-94. (canceled)
Dependencies are inferred from the claim text.