Chemical solution and method for treating substrate
AssigneeFUJIFILM Corporation
InventorsTomonori TAKAHASHI, Nobuaki Sugimura, Hiroyuki Seki
Life of this patent
Estimating the term…
Abstract
The present invention provides a chemical solution, which has an excellent dissolving ability for a transition metal-containing substance and can realize excellent smoothness of a portion to be treated, and a treatment method using the chemical solution. The chemical solution according to an embodiment of the present invention is a chemical solution used for removing a transition metal-containing substance on a substrate and includes periodic acids and a compound including one or more kinds of anions selected from the group consisting of IO3−, I−, and I3−, in which a content of the compound including anions with respect to a total mass of the chemical solution is 5 ppb by mass to 1% by mass.
Claims22
A chemical solution used for removing a transition metal-containing substance on a substrate, comprising:
- one or more kinds of periodic acids selected from the group consisting of a periodic acid and a salt thereof;
- and
- a compound including one or more kinds of anions selected from the group consisting of IO3−, I−, and I3−,
- wherein a content of the compound including anions with respect to a total mass of the chemical solution is 5 ppb by mass to 1% by mass.
Dependencies are inferred from the claim text.