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US 2020/0346982 A1Published application
Powder for additive modeling, structure, semiconductor production device component, and semiconductor production device
AssigneeCanon Kabushiki Kaisha
InventorsNobuhiro Yasui, Hisato Yabuta, Kanako Oshima
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Abstract
A material powder for additive modeling including a nitride, and a eutectic oxide, the nitride having an average density lower than an average density of the eutectic oxide, is used to produce a structure using an additive modeling method.
Claims6
A structure, comprising a nitride region having an average diameter of 5 μm to 100 μm, and an oxide region forming a eutectic structure including the nitride region,
- wherein the eutectic structure contains aluminum oxide, and a compound of a rare earth oxide and aluminum oxide.
A method of producing a structure, the method comprising:
- preparing a powder containing a nitride particle and a particle containing a eutectic oxide containing aluminum oxide, and a compound of a rare earth oxide and aluminum oxide;
- constituting a powder layer including the powder;
- and
- irradiating the powder layer with an energy beam according to shape data of a three-dimensional model, the powder layer being irradiated with the energy beam so that a temperature of an irradiation portion of the energy beam is less than or equal to a decomposition temperature of the nitride particle.
1 more element
Dependencies are inferred from the claim text.