Matrix film deposition system
AssigneeShimadzu Corporation
InventorsKenta TERASHIMA, Koretsugu OGATA
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AssigneeShimadzu Corporation
InventorsKenta TERASHIMA, Koretsugu OGATA
Estimating the term…
In a system for depositing a matrix film by nebulizing a matrix solution onto a sample plate P to which a sample is attached, a chamber 10 housing a sample stage 11 to which a sample plate is attached, a nebulizing nozzle 20 for nebulizing the matrix solution onto the sample stage, a gas inlet 14 formed in the chamber, replacement gas suppliers 40, 41, 42, 43, 47 for supplying a replacement gas to the gas inlet, and replacement gas diffusers 15, 17 for diffusing a flow of the replacement gas in the chamber are provided. According to such a configuration, it is possible to perform gas replacement in the chamber while preventing the formation of a humidity gradient due to the gas flow of the replacement gas. As a result, the humidity in the chamber is kept constant and uniform, and the size of a crystal grain formed on the sample plate and the extraction efficiency of the sample components by the matrix solution can be stabilized.
A matrix film deposition system, comprising:
Dependencies are inferred from the claim text.