System and Method for Accurate Application and Curing of Nail Polish
AssigneeCoral Labs, Inc.
InventorBradley Leong
Life of this patent
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Abstract
A nail polish application system may include a nail polish applicator to apply a curable nail polish to a nail of a user. An energy source may emit energy to selectively cure the curable nail polish. A sensor may be provided to detect a boundary of the nail of the user. The energy source may be configured to direct the energy to (i) the detected boundary of the nail during a first curing stage or (ii) to an area within the detected boundary of the nail during the first curing stage, and to (iii) avoid directing the energy to an area outside the detected boundary of the nail during the first curing stage.
Claims20
A method of performing a manicure, the method comprising:
- providing a user with a strip of material containing curable nail polish in an uncured state;
- detecting a boundary of the nail of the user using a sensor;
- applying the strip of material to a nail of the user;
- and
- selectively curing an amount of the uncured nail polish using an energy source that emits energy for the selective curing.
A nail polish application system comprising:
- a nail polish applicator configured to apply a curable nail polish to a nail of a user, the nail polish applicator including a strip of material containing the curable nail polish thereon;
- an energy source configured to emit energy to selectively cure the curable nail polish;
- and
- a sensor for detecting a boundary of the nail of the user, the sensor being operatively connected to the energy source.
Dependencies are inferred from the claim text.