Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device
AssigneeGigaphoton Inc.
InventorsAtsushi UEDA, Gota NIIMI, Georg SOUMAGNE
Life of this patent
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Abstract
An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
Claims20
An extreme ultraviolet chamber apparatus comprising:
- a chamber;
- an EUV condensing mirror arranged in the chamber;
- a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror;
- a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror;
- and
- an exhaust port arranged in the chamber.
An extreme ultraviolet light generation system comprising:
- a chamber;
- a target supply unit configured to output a target toward a predetermined region in the chamber;
- a laser device configured to irradiate the target with a pulse laser beam to turn the target into plasma;
- an EUV condensing mirror arranged in the chamber;
- a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror;
- a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror;
- and
- an exhaust port arranged in the chamber.
A method for manufacturing an electronic device comprising:
- irradiating a target with a pulse laser beam to generate extreme ultraviolet light in an extreme ultraviolet light generation system including a chamber, a target supply unit configured to output the target toward a predetermined region in the chamber, a laser device configured to irradiate the target with the pulse laser beam to turn the target into plasma, an EUV condensing mirror arranged in the chamber, a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror, a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror, and an exhaust port arranged in the chamber;
- outputting the extreme ultraviolet light to an exposure device;
- and
- exposing a photosensitive substrate to the extreme ultraviolet light in the exposure device to manufacture an electronic device.
Dependencies are inferred from the claim text.