Substrate processing apparatus and method for processing substrates
AssigneeASM IP Holding B.V.
InventorsDieter Pierreux, Werner Knaepen, Bert Jongbloed, Jeroen Fluit
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Abstract
The disclosure relates to a substrate processing apparatus, comprising: a first reactor constructed and arranged to process a rack with a plurality of substrates therein; a second reactor constructed and arranged to process a substrate; and, a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor. The second reactor may be provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.
Claims28
A substrate processing apparatus, comprising:
- a first reactor constructed and arranged to process a rack with a plurality of substrates therein;
- a second reactor constructed and arranged to process a substrate;
- and,
- a substrate transfer device constructed and arranged to transfer substrates to and from the first and second reactor;
- wherein the second reactor is provided with an illumination system constructed and arranged to irradiate ultraviolet radiation within a range from 100 to 500 nanometers onto a top surface of at least a substrate in the second reactor.
A method of processing a substrate comprising:
- providing a substrate in a rack with a plurality of substrates;
- loading the rack with a plurality of substrates in a first reactor;
- providing a first precursor in the first reactor to deposit a layer on the substrates;
- unloading the rack with a plurality of substrates from the first reactor;
- transferring a substrate with the deposited layer to a second reactor;
- and,
- illuminating the deposited layer of the substrate in the second reactor with ultraviolet radiation within a range from 100 to 500 nanometers.
Dependencies are inferred from the claim text.