Precursor solution for thin film deposition and thin film forming method using same
AssigneeSK Trichem
InventorsYong Joo PARK, Han Sol OH, In Chun HWANG, Sang Ho KIM, Chang Sung HONG, Sang Kyung LEE
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Abstract
A precursor solution for thin-film deposition including a functional solvent selected from among liquid alkene and liquid alkyne capable of dissolving a metal halide at room temperature and a metal halide dissolved in the functional solvent and existing as a liquid at room temperature, thereby solving problems caused by halogen gas generated in a chamber during a deposition process and improving the uniformity of the thickness of a thin film.
Claims10
A precursor solution for thin-film deposition, comprising a functional solvent selected from among a liquid alkene and a liquid alkyne capable of dissolving a metal halide at room temperature and a metal halide dissolved in the functional solvent and existing as a liquid at room temperature.
Dependencies are inferred from the claim text.