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US 2020/0270746 A1Published application
Dielectric filled nanostructured silica substrate for flat optical devices
AssigneeApplied Materials, Inc.
InventorsTapashree ROY, Rutger MEYER TIMMERMAN THIJSSEN, Ludovic GODET, Jinxin FU
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Abstract
A method and apparatus for creating a flat optical structure is disclosed. The method includes etching at least one trench in a substrate, placing a dielectric material in at least one trench in the substrate and encapsulating the top of the substrate with a film.
Claims20
A method for creating a flat optical structure, comprising:
- etching at least one trench in a substrate;
- placing a dielectric material in the at least one trench in the substrate;
- and
- encapsulating a top of the substrate with a film.
1 more element
A method for creating a flat optical structure, comprising:
- depositing a material on to a first face of a substrate;
- etching at least one trench in the material deposited on the first face of the substrate;
- and
- encapsulating a top of the material deposited on the first face of the substrate with an encapsulating material.
1 more element
An arrangement, comprising:
- a substrate with at least one trench;
- a material placed in at least one trench;
- and
- an encapsulating material placed in contact with the substrate and the material.
1 more element
Dependencies are inferred from the claim text.