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US 2020/0270740 A1Published application
Evaporation mask and manufacturing method thereof
AssigneesBoe Technology Group Co., Ltd., Ordos Yuansheng Optoelectronics Co., Ltd.
InventorsFengli JI, Yinan LIANG
Life of this patent
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Abstract
A mask and a manufacturing method thereof are disclosed. The mask includes a mask substrate; the mask substrate includes a mask area; the mask area includes an active area and a dummy area located at a periphery of the active area; a plurality of via holes penetrating the mask substrate is disposed in both of the active area and the dummy area; the plurality of via holes disposed in the dummy area is filled with a blocking material.
Claims20
An evaporation mask, comprising:
- a mask substrate, comprising a mask area which comprises an active area and a dummy area located at a periphery of the active area, a plurality of via holes penetrating the mask substrate being disposed in both of the active area and the dummy area,
- the plurality of via holes disposed in the dummy area being filled with a blocking material.
A manufacturing method of an evaporation mask, comprising:
- forming a plurality of via holes penetrating a mask substrate in a mask area of the mask substrate, the mask area comprising an active area and a dummy area located at a periphery of the active area, both of the active area and the dummy area being provided with the via holes;
- and
- filling a blocking material into the plurality of via holes in the dummy area.
Dependencies are inferred from the claim text.