Alumina sintered body and manufacturing method therefor
AssigneeCoorsTek, Inc.
InventorsSayuki YOSHIDA, Yukihisa MIYASHITA
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Abstract
The present invention relates to an alumina sintered body and a manufacturing method therefor; for example, the present invention relates to an alumina sintered body that is suitably utilized for a member or similar used in a plasma processing device, an etcher for semiconductor/liquid crystal display device manufacturing, a CVD device, or similar, or that is suitably utilized for a substrate or similar of a plasma-resistant member which is to be coated, as well as a manufacturing method for said alumina sintered body.
Claims10
An alumina-based sintered object having an Al content, in terms of Al2O3 content, of 70% by weight or higher,
- wherein the alumina-based sintered object has a Zr content, in terms of ZrO2 content, of 1% to 30% by weight, an Si content, in terms of SiO2 content, of 170 ppm to 600 ppm, and an Na content, in terms of Na2O content, of 27 ppm or less.
An alumina-based sintered object having an Al content, in terms of Al2O3 content, of 70% by weight or higher,
- wherein the alumina-based sintered object has a Zr content, in terms of ZrO2 content, of 30% by weight or less, a Y content, in terms of Y2O3 content, of 1% to 10% by weight, an Si content, in terms of SiO2 content, of 170 ppm to 600 ppm, and an Na content, in terms of Na2O content, of 27 ppm or less, and
- the Y content, in terms of Y2O3 content, is not more than the Zr content, in terms of ZrO2 content.
An alumina-based sintered object having an Al content, in terms of Al2O3 content, of 99.8 wt % or higher,
- wherein the alumina-based sintered object has an Si content, in terms of SiO2 content, of 170 ppm to 600 ppm and an Na content, in terms of Na2O content, of 27 ppm or less, and
- the alumina-based sintered object has a density of 3.96 g/cm3 or higher.
Dependencies are inferred from the claim text.