Array substrate, manufacturing method thereof, and display panel

A manufacturing method of an array substrate, the array substrate comprises a substrate, at least one top gate TFT and at least one bottom gate TFT disposed on the substrate and located in each sub-pixel region, the method comprising:

• forming an active layer pattern of the first top gate TFT through a single patterning process;
• forming a gate insulating layer covering the substrate on which an active layer pattern of the first top gate TFT has been formed;
• forming, through a single patterning process, a gate of the first top gate TFT and a gate of the first bottom gate TFT on the substrate on which the gate insulating layer has been formed;
• forming a gate insulating layer covering the substrate;
• and
• forming, through a single patterning process, an active layer pattern of the first bottom gate TFT on the substrate on which the gate insulating layer has been formed, wherein orthographic projections of the active layer pattern of the first top gate TFT and the active layer pattern of the first bottom gate TFT on the substrate are spaced from each other in a first direction.