Display device and method of fabricating the same

A method of manufacturing a display unit, the method comprising:

• forming an active pattern layer (APL) and an active insulating layer (AIL) which substantially covers the active pattern layer on a base layer (BL);
• forming a first metal layer (ML1) and an anti-reflection material layer (RML) which substantially covers the first metal layer on the active insulating layer;
• forming a first metal pattern layer (MPL1) which comprises a plurality of first conductive lines and a first anti-reflection pattern layer which has the same pattern as the first metal pattern layer by substantially simultaneously etching the first metal layer and the anti-reflection material layer;
• forming a first insulating layer (IL1) on the active insulating layer to substantially cover the first metal pattern layer and the first anti-reflection pattern layer,
• forming a second metal layer (ML2) and an anti-reflection material layer (RML) which substantially covers the second metal layer on the first insulating layer, and
• forming a second metal pattern layer (MPL2) comprising a plurality of second conductive lines and a second anti-reflection pattern layer which has the same pattern as the second metal pattern layer by substantially simultaneously etching the second metal layer and the anti-reflection material layer,
• wherein part of the first metal pattern layer overlaps at least part of the active pattern layer along a direction orthogonal to an upper surface of the base layer, and part of the second metal pattern layer overlaps at least part of the active pattern layer along the direction orthogonal to the upper surface of the base layer,
• wherein the anti-reflection material layer comprises a metal oxide having an empirical formula of MoaXbOc, where a and c are rational numbers greater than zero, b is a rational number equal to or greater than zero, and X includes at least one element selected from tantalum (Ta), vanadium (V), niobium (Nb), zirconium (Zr), tungsten (W), hafnium (Hf), titanium (Ti), or rhenium (Re).