MgO SINTERED SPUTTERING TARGET
AssigneeJX Nippon Mining & Metals Corporation
InventorsYoshitaka Shibuya, Satoyasu Narita, Hiroki Kajita
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Abstract
A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher. A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 90% or higher. An object of the present invention is to provide a MgO sintered sputtering target capable of reducing particles.
Claims16
A MgO sintered sputtering target, wherein a ratio of GOS (Grain Orientation Spread) being 0° to 1° is 75% or higher.
A MgO sintered sputtering target, wherein a ratio of KAM (Kernel Average Misorientation) being 0° to 2° is 85% or higher.
Dependencies are inferred from the claim text.