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US 2020/0206789 A1Published application
Charged Particle Beam Apparatus and Cleaning Method
AssigneeHitachi High-Technologies Corporation
InventorsAkinari MORIKAWA, Kotaro HOSOYA
Life of this patent
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Abstract
To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
Claims14
-13. (canceled)
A charged particle beam apparatus comprising:
- a stage on which a sample is placed;
- a lens barrel in which the sample is scanned with a charged particle beam;
- a cleaner configured to remove a contaminant on the sample by oxidation from a direction different from a direction in which the lens barrel is disposed;
- a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
1 more element
A cleaning method performed by a charged particle beam apparatus, wherein the charged particle beam apparatus includes:
- a stage on which a sample is placed;
- a lens barrel in which the sample is scanned with a charged particle beam;
- a cleaner configured to remove a contaminant on the sample by oxidation from a direction different from a direction where the lens barrel is disposed;
- a stage control unit configured to move the stage, the cleaning method comprising:
- an adjusting step of adjusting, by the stage control unit, a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
2 more elements
Dependencies are inferred from the claim text.