Method for manufacturing a horology component
AssigneeRolex SA
InventorsFlorian Calame, Alexandra Maegli, Xavier Multone
Life of this patent
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Abstract
Method for manufacturing a master pattern for a mold for a horology component, wherein the method includes manufacturing a first structure from a first photosensitive resin comprising at least one layer of photosensitive resin comprising a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask, then developing the first photosensitive resin; and transforming the first structure into a second structure by structuring at least one surface of the first structure by the addition of a second photosensitive resin to the at least one surface.
Claims20
A method for manufacturing a master pattern for a mold for a horology component, wherein the method comprises:
- manufacturing a first structure from a first photosensitive resin comprising at least one layer of photosensitive resin comprising a first pattern obtained by polymerizing the first photosensitive resin by irradiation through at least one mask, then developing the first photosensitive resin;
- and
- transforming the first structure into a second structure by structuring at least one surface of the first structure by the addition of a second photosensitive resin to the at least one surface,
- wherein the transforming comprises:
- (i) applying a layer of the second photosensitive resin on at least part of the at least one surface of the first structure;
- (ii) performing two-photon polymerization on the second photosensitive resin in order to obtain three-dimensional polymerization according to a second pattern, using a photon device which comprises an objective which is at least partially immersed in the second resin to direct and focus a beam on voxels that define a shape and/or a geometry of the second pattern;
- and
- (iii) developing in order to eliminate the non-polymerized second photosensitive resin and obtain the second structure of a form defined by the first and second patterns.
Dependencies are inferred from the claim text.