Triphenylgermylsilane and trichlorosilyl-trichlorogermane for the production of germanium-silicon layers, and method for the production thereof from trichlorosilyl-triphenylgermane

Abstract

Triphenylgermylsilane (Ph3Ge—SiH3) is useful for the production of germanium-silicon layers (Ge—Si) or as transfer agent of silane groups (SiH3). Further, a method describes the production of triphenylgermylsilane (Ph3Ge—SiH3) by reducing trichlorosilyltriphenylgermane (Ph3Ge—SiCl3) with a hydride in solution, and another method describes the production of trichlorosilyltrichlorogermane (C3Ge—SiCl3) by reacting trichlorosilyltriphenylgermane (Ph3Ge—SiCl3) with hydrogen chloride (HCl) in the presence of AlCl3 in solution. In addition, trichlorosilyltrichlorogermane is also used for the production of germanium-silicon layers (Ge—Si).

Dependencies are inferred from the claim text.