Abatement systems including an oxidizer head assembly and methods for using the same

An abatement system comprising:

• an oxidizer head assembly comprising:
• a head body defining:
• an inlet flange;
• an outlet flange positioned opposite the inlet flange;
• and
• a wall extending between the inlet flange and the outlet flange, wherein the inlet flange, the outlet flange, and the wall define a cavity positioned between the inlet flange and the outlet flange, the cavity being bounded by the inlet flange and the wall and defining an outlet opening defined by the outlet flange;
• a plurality of nozzles extending through the cavity between the inlet flange and the outlet flange;
• a fuel inlet in communication with the plurality of nozzles;
• a shield gas inlet in communication with the cavity;
• and
• a porous diffuser plate extending across the outlet opening, the porous diffuser plate comprising apertures for the plurality of nozzles and a plurality of pores, wherein a shield gas passes through the shield gas inlet, through the cavity, and through the plurality of pores of the porous diffuser plate around the plurality of nozzles and a fuel passes through the plurality of nozzles;
• a burner plenum coupled to the outlet flange and in communication with the oxidizer head assembly, the burner plenum defining a burner cavity;
• and
• an oxidizer gas inlet coupled to and in communication with the burner plenum, wherein a process gas passes through the oxidizer gas inlet and the plurality of nozzles into the burner plenum.

A method for abating silicon tetrafluoride, the method comprising:

• passing a process gas comprising silicon tetrafluoride into a burner plenum;
• passing a fuel through a plurality of nozzles that extend through a cavity of an oxidizer head assembly and through a porous diffuser plate;
• passing a shield gas through the cavity of the oxidizer head assembly and through a plurality of pores of the porous diffuser plate;
• and
• combusting the fuel and the process gas to form resultants comprising hydrogen fluoride and silicon dioxide.