Process for producing isomer enriched higher silanes
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorGrigory NIKIFOROV
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Abstract
Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by catalysis of silane (SiH4), disilane (Si2H6), trisilane (Si3H8), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of n-tetrasilane.
Claims21
A method of selectively synthesizing n-tetrasilane, the method comprising:
- producing a silane mixture having a n-Si4H10:i-Si4H10 ratio ranging from approximately 5:1 to approximately 15:1 by reacting a SinH(2n+2) reactant, wherein n=1-3, with a heterogeneous catalyst selected from a Group I, II or III element from the Periodic Table or oxides, alkyls, hydrides, silanides, or silyl amides thereof.
A method of selectively synthesizing n-tetrasilane, the method comprising:
- producing a n-Si4H10:i-Si4H10 silane mixture having a ratio ranging from approximately 5:1 to approximately 12:1 by catalyzing liquid Si3H8 using a catalyst selected from the group consisting of sodium, sodium oxide, sodium bis(2-methoxyethoxy)aluminum hydride, potassium bis(trimethylsilyl)amide (KN(SiMe3)2), lithium aluminum hydride (LiAlH4), potassium triphenyl silicon (KSiPh3), potassium hydride (KH), and mixtures thereof.
A Si-containing film forming composition comprising approximately 95% w/w to approximately 100% w/w n-Si4H10.
Dependencies are inferred from the claim text.