Vessel for extreme ultraviolet radiation source
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsSsu-Yu CHEN, Che-Chang HSU, Chi YANG, Shang-Chieh CHIEN, Li-Jui CHEN, Po-Chung CHENG
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsSsu-Yu CHEN, Che-Chang HSU, Chi YANG, Shang-Chieh CHIEN, Li-Jui CHEN, Po-Chung CHENG
Estimating the term…
A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.
A method of operating an EUV light generation apparatus, wherein the EUV light generation apparatus includes a vessel having a gas inlet, an interface port to be connected to a scanner, a gate valve disposed at the interface port and an exhaust port, the method comprising:
A method of operating an EUV light generation apparatus, wherein the EUV light generation apparatus includes a vessel having a gas inlet, an interface port connected to a scanner, a gate valve disposed at the interface port and an exhaust port, the method comprising:
An apparatus for generating extreme ultraviolet (EUV) radiation, comprising:
Dependencies are inferred from the claim text.