Magnetic memory device, method for manufacturing the same, and substrate treating apparatus

A method for manufacturing a magnetic memory device, the method comprising:

• forming a magnetic layer on a substrate;
• forming an oxide layer on the magnetic layer;
• forming a capping layer on the oxide layer;
• forming a first hard mask layer on the capping layer;
• and
• performing an oxidation process to control an interface property between the oxide layer and the magnetic layer,
• wherein the capping layer includes a first region and a second region, and
• wherein forming the first hard mask layer includes forming the first hard mask layer on the second region of the capping layer to expose the first region of the capping layer.

A substrate treating apparatus, comprising:

• an index module;
• a transfer module at a side of the index module;
• a first process chamber at a side of the transfer module;
• and
• a second process chamber at another side of the transfer module,
• wherein:
• the first process chamber is configured to perform an oxidation process on a substrate, and
• the second process chamber is configured to perform a deposition process on the substrate on which the oxidation process is performed.