Semiconductor device
AssigneeRohm Co., Ltd.
InventorKohei MURASAKI
Life of this patent
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Abstract
A semiconductor device includes a semiconductor layer that has a main surface and that includes an active region, a first-conductivity-type first impurity region formed at a surface layer portion of the main surface of the semiconductor layer, a second-conductivity-type field limit region formed along a peripheral edge of the active region in a surface layer portion of the first impurity region, and a second-conductivity-type low concentration region that has a second-conductivity-type impurity concentration lower than a second-conductivity-type impurity concentration of the field limit region and that is formed along a peripheral edge of the field limit region in a region on a side opposite to the active region with respect to the field limit region in the surface layer portion of the first impurity region.
Claims21
A semiconductor device comprising:
- a semiconductor layer that has a main surface and that includes an active region;
- a first-conductivity-type first impurity region formed at a surface layer portion of the main surface of the semiconductor layer;
- a second-conductivity-type field limit region formed along a peripheral edge of the active region in a surface layer portion of the first impurity region;
- and
- a second-conductivity-type low concentration region that has a second-conductivity-type impurity concentration lower than a second-conductivity-type impurity concentration of the field limit region and that is formed along a peripheral edge of the field limit region in a region on a side opposite to the active region with respect to the field limit region in the surface layer portion of the first impurity region.
Dependencies are inferred from the claim text.