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US 2020/0091207 A1Published application
Method for fabricating image sensor
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYun-Wei CHENG, Yin-Chieh HUANG, Chun-Hao CHOU, Kuo-Cheng LEE, Hsun-Ying HUANG
Life of this patent
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Abstract
A method includes depositing a first reflective layer over a substrate. A first dielectric layer is deposited over the first reflective layer. A second dielectric layer is deposited over the first dielectric layer. The second dielectric layer, the first dielectric layer, and the first reflective layer are etched to form a grid isolation structure that defines a recess. The recess is filled with a color filter.
Claims20
A method, comprising:
- depositing a first reflective layer over a substrate;
- depositing a first dielectric layer over the first reflective layer;
- depositing a second dielectric layer over the first dielectric layer;
- etching the second dielectric layer, the first dielectric layer, and the first reflective layer to form a grid isolation structure that defines a recess;
- and
- filling the recess with a color filter.
3 more elements
A method, comprising:
- depositing a reflective layer over a substrate;
- depositing a first dielectric layer over the reflective layer;
- etching the first dielectric layer;
- after etching the first dielectric layer, etching the reflective layer, such that the etched first dielectric layer and the etched reflective layer form a grid isolation structure that defines a recess;
- and
- filling the recess with a color filter.
3 more elements
A method, comprising:
- depositing a first reflective layer over a substrate;
- depositing a first dielectric layer over the first reflective layer;
- etching the first dielectric layer and the first reflective layer to form a grid isolation structure that defines a recess, wherein a width of a bottom surface of the etched first dielectric layer is less than a width of a bottom surface of the etched first reflective layer;
- and
- filling the recess with a color filter.
2 more elements
Dependencies are inferred from the claim text.