Array substrate, manufacturing method thereof, display panel and manufacturing method thereof

A manufacturing method of an array substrate, comprising:

• forming a gate metal layer on a base by a first patterning process;
• forming a gate insulating layer on the gate metal layer;
• forming a semiconductor layer and a source/drain metal layer by a second patterning process on the base formed with the gate metal layer and the gate insulating layer thereon, wherein the source/drain metal layer comprises a data line and metal electrodes connected to the data line;
• forming a first electrode and a channel region by a third patterning process on the base formed with the semiconductor layer and the source/drain metal layer thereon, wherein the channel region forms a source electrode and a drain electrode from the metal electrodes;
• forming a passivation layer and an organic insulating layer by a fourth patterning process on the base formed with the first electrode thereon;
• the organic insulating layer at least corresponds to the data line;
• and
• forming a second electrode by a fifth patterning process on the base formed with the organic insulating layer thereon.