One transistor and one ferroelectric capacitor memory cells in diagonal arrangements
AssigneeIntel Corporation
InventorsDaniel H. Morris, Uygar E. Avci, Ian A. Young
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AssigneeIntel Corporation
InventorsDaniel H. Morris, Uygar E. Avci, Ian A. Young
Estimating the term…
Described herein are one access transistor and one ferroelectric capacitor (1T-1FE-CAP) memory cells in diagonal arrangements, as well as corresponding methods and devices. When access transistors of memory cells are implemented as FinFETs, then, in a first diagonal arrangement, memory cells are arranged so that the BLs for the cells are diagonal with respect to the fins of the access transistors of the cells, while the WLs for the cells are perpendicular to the fins. In a second diagonal arrangement, memory cells are arranged so that the fins of the access transistors of the cells are diagonal with respect to the WLs for the cells, while the BLs for the cells are perpendicular to the WLs. Such diagonal arrangements may advantageously allow achieving high layout densities of 1T-1FE-CAP memory cells and may benefit from the re-use of front-end transistor process technology with relatively minor adaptations.
A memory device, comprising:
A memory device, comprising:
A method of operating a memory device comprising an access transistor and a ferroelectric capacitor, the method comprising:
A method of operating a memory device comprising an access transistor and a ferroelectric capacitor provided, the method comprising:
Dependencies are inferred from the claim text.