Integrated circuit cavity formation with multiple interconnection pads

Abstract

Certain aspects of the present disclosure provide techniques for forming a cavity with various conductive pad interconnections for receiving an electronic component in an integrated circuit. One example method of fabricating an integrated circuit generally includes forming a conductive metal above a first substrate layer, forming a barrier metal above the conductive metal, disposing at least one second substrate layer above the barrier metal, forming a cavity in the at least one second substrate layer by using a laser to expose the barrier metal and the conductive metal in the cavity, and etching the conductive metal in the form of a conductive pad pattern for coupling the conductive metal to an electronic component.

Dependencies are inferred from the claim text.