Manufacturing method and inspection method of group-iii nitride laminate, and group-iii nitride laminate

A group-III nitride laminate comprising a group-III nitride substrate and a group-III nitride epitaxial layer formed above a main surface of the group-III nitride substrate;

• in which, regarding a relative yellow intensity which is a rate of a yellow emission intensity to a band edge emission intensity in photoluminescence in the group-III nitride epitaxial layer,
• a correspondence relationship between a magnitude of an off-angle formed by a normal direction of the main surface of the group-III nitride substrate and c-axis direction, and the relative yellow intensity has a tendency such that as the magnitude of the off-angle is increased, the relative yellow intensity is decreased, with a degree of the decrease in the relative yellow intensity becoming small.

A group-III nitride laminate comprising a group-III nitride substrate and a group-III nitride epitaxial layer formed above a main surface of the group-III nitride substrate,

• in which, regarding a relative yellow intensity which is a rate of a yellow emission intensity to a band edge emission intensity in photoluminescence in the group-III nitride epitaxial layer,
• positions where the relative yellow intensity shows a first constant value are distributed along a first arc or a first elliptic arc, and positions where the relative yellow intensity shows a second constant value different from the first constant value are distributed along a second arc concentric with the first arc or along a second elliptic arc concentric with the first elliptic arc, on the group-III nitride epitaxial layer.