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AssigneeShanghai Micro Electronics Equipment (Group) Co., Ltd.
InventorsZhi ZHU, Zhijun HUO
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A machine vision system for substrate alignment includes first and second illumination sources (11, 12), first and second reflectors (21, 22), first and second objective lenses (31, 32) and first and second detectors (41, 42), each of which pair is symmetric with respect to an X-axis. Light beams emitted from the first and second illumination sources are irradiated on and reflected by respective substrates (1, 2), amplified by the respective objective lenses and received and detected by the respective detectors. An alignment apparatus is also disclosed. Disposing each of the pair of the first and second illumination sources, the first and second reflectors, the first and second objective lenses and the first and second detectors in symmetry with respect to the X-axis results in a significantly reduced footprint of the machine vision system along the orientation of lens barrels of the objective lenses and hence an expanded detection range thereof and improved alignment efficiency and accuracy.
A machine vision system for substrate alignment, disposed between first and second substrates arranged in symmetry along an X-axis, the machine vision system comprising first and second illumination sources, first and second reflectors, first and second objective lenses and first and second detectors, wherein each pair of the first and second illumination sources, the first and second reflectors, the first and second objective lenses and the first and second detectors is symmetric with respect to the X-axis, and wherein light beams emitted from the first and second illumination sources are irradiated on and reflected by the respective substrates, amplified by the respective objective lenses and received and detected by the respective detectors.
Dependencies are inferred from the claim text.