Substrate Processing Apparatus, Substrate Processing Method, and Recording Medium

A method of processing a substrate by a substrate processing apparatus that includes:

• a nozzle configured to discharge a processing solution;
• and
• a processing solution supplier configured to supply the processing solution to the nozzle and including:
• a tank in which the processing solution is received;
• a first conduit configured to guide the processing solution from the tank to the nozzle;
• a pump installed in the first conduit;
• and
• a filter installed in the first conduit between the tank and the pump, and having a first space defined at a side of the tank, a second space defined at a side of the pump and a filtering member configured to separate between the first space and the second space;
• wherein the method comprises:
• performing a first control process to supply the processing solution from the first space to the second space through the filtering member by the pump;
• and
• following the first control process, performing a second control process to direct the processing solution from the second space to the first space through the filtering member by the pump.