US 2020/0052021 A1 · SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING SOLID-STATE IMAGING DEVICE

Abstract

A solid-state imaging device including a semiconductor substrate including photoelectric conversion elements, and having color filters of plural colors formed on the semiconductor substrate and positioned in correspondence to the photoelectric conversion elements, a first visible-light transmissive layer formed between the semiconductor substrate and the color filters, and second visible-light transmissive layers each formed between adjacent color filters. The second visible-light transmissive layers include a same material as the first visible-light transmissive layer and are continuous with the first visible-light transmissive layer. The color filters having a largest area among the color filters of the plural colors each have an edge portion being continuous with an edge portion of a corresponding one of the second visible-light transmissive layers, and the color filters having the largest area each have a side wall on which a reaction product layer including a material forming the first visible-light transmissive layer is formed.

Claims20

Dependent claims

A solid-state imaging device, comprising:

a semiconductor substrate including a plurality of two-dimensionally positioned photoelectric conversion elements, and having a plurality of color filters of a plurality of colors formed on the semiconductor substrate and positioned in correspondence to the photoelectric conversion elements;
a first visible-light transmissive layer formed between the semiconductor substrate and the color filters;
and
a plurality of second visible-light transmissive layers each formed between adjacent color filters, the second visible-light transmissive layers comprising a same material as the first visible-light transmissive layer and being continuous with the first visible-light transmissive layer,
wherein color filters having a largest area among the color filters of the plurality of colors each have an edge portion being continuous with an edge portion of a corresponding one of the second visible-light transmissive layers, and
the color filters having the largest area each have a side wall on which a reaction product layer including a material forming the first visible-light transmissive layer is formed.

3 more elements

A method of producing a solid-state imaging device, comprising:

forming a visible-light transmissive layer on a semiconductor substrate which includes a plurality of two-dimensionally positioned photoelectric conversion elements, and has a plurality of color filters of a plurality of colors formed on the semiconductor substrate and positioned in correspondence to the photoelectric conversion elements;
dry etching the visible-light transmissive layer such that the visible-light transmissive layer is patterned with openings formed at positions where first-color color filters among the color filters are to be formed;
applying a first-color color filter material to the visible-light transmissive layer such that the openings are filled with the first-color color filter material;
curing the first-color color filter material such that first-color color filters are formed on the visible-light transmissive layer;
dry etching the visible-light transmissive layer and the first-color color filters such that openings are formed at positions where other color filters are to be formed;
and
forming the other color filters by photolithographic patterning.

4 more elements

Dependencies are inferred from the claim text.

Solid-state imaging device and method of producing solid-state imaging device

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Solid-state imaging device and method of producing solid-state imaging device

Life of this patent

Abstract

Claims20