Progressive heating of components of substrate processing systems using tcr element-based heaters
AssigneeLam Research Corporation
InventorsRamesh CHANDRASEKHARAN, Easwar SRINIVASAN
Life of this patent
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Abstract
A heater control system for heating components of a substrate processing system includes N heater zones, where N is an integer greater than zero. Each of the N heater zones heats a component of the substrate processing system and includes a resistive heater and a temperature sensor to sense a local temperature in a corresponding one of the N heater zones. A controller is configured to determine an average temperature of each of the N heater zones based on a resistance of the resistive heater in each of the N heater zones. The controller controls the resistive heater based on the average temperature and the local temperature in each of the N heater zones.
Claims18
A heater control system for heating components of a substrate processing system, comprising:
- N heater zones, where N is an integer greater than zero, wherein each of the N heater zones heats a component of the substrate processing system and includes:
- a resistive heater;
- and
- a temperature sensor to sense a local temperature in a corresponding one of the N heater zones;
- and
- a controller configured to:
- determine an average temperature of each of the N heater zones based on a resistance of the resistive heater in each of the N heater zones, and
- control the resistive heater based on the average temperature and the local temperature in each of the N heater zones.
A heater control system for a gas delivery system of a substrate processing system, comprising:
- an oven to enclose one or more components of the substrate processing system and to maintain a predetermined temperature in the oven;
- N resistive heaters arranged inside of the oven, wherein:
- N is an integer greater than one,
- each of the N resistive heaters selectively heats at least a portion of one of the components in the oven, and
- the N resistive heaters are uninsulated;
- and
- a controller configured to maintain the predetermined temperature in localized regions in the oven by determining a resistance in each of the N resistive heaters and adjusting power to each of the N resistive heaters based on N−1 resistance ratios of N−1 of the N resistive heaters relative to one of the N resistive heaters.
Dependencies are inferred from the claim text.