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US 2020/0051801 A1Published application
Method for neutralizing ion beam, and apparatus using the method
AssigneeNissin Ion Euqipment Co., Ltd.
InventorYusuke KUWATA
Life of this patent
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Abstract
A method and apparatus are provided. The method includes selectively supplying a neutralizing gas to a position on a trajectory of an ion beam between an extraction electrode system and an analysis slit based on a composition of a dopant gas introduced into an ion source that produces the ion beam. The apparatus includes the ion source, the extraction electrode system, the analysis slit, and a gas supply system that selectively supplies the neutralizing gas to the position on the trajectory.
Claims13
A method comprising:
- selectively supplying a neutralizing gas to a position on a trajectory of an ion beam between an extraction electrode system and an analysis slit based on a composition of a dopant gas introduced into an ion source that produces the ion beam.
An apparatus comprising:
- an ion source which ionizes a dopant gas;
- an extraction electrode system which extracts ionized ions in an ion beam from the ion source;
- a mass analysis electromagnet which mass-analyzes the ion beam;
- an analysis slit disposed downstream of the mass analysis electromagnet;
- a gas supply system disposed at a position on a trajectory of the ion beam between the extraction electrode system and the analysis slit to supply a neutralizing gas to the ion beam;
- and
- a controller which inhibits a supply of the neutralizing gas f to the position when the dopant gas contains halogen, and supplies the neutralizing gas to the position to neutralize the ion beam, when the dopant gas contains no halogen.
4 more elements
An apparatus comprising:
- an ion source which ionizes a dopant gas;
- an extraction electrode system which extracts an ion beam from the ion source;
- a mass analysis electromagnet which mass-analyzes the ion beam;
- an analysis slit disposed downstream of the mass analysis electromagnet;
- and
- a gas supply system configured to, based on a composition of the dopant gas, selectively supply a neutralizing gas to a position on a trajectory of the ion beam between the extraction electrode system and the analysis slit.
3 more elements
Dependencies are inferred from the claim text.