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US 2020/0051797 A1Published application
Multicathode Deposition System
AssigneeApplied Materials, Inc.
InventorsSanjay Bhat, Vibhu Jindal, Kamatchigobinath Manoharan
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Abstract
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.
Claims20
A physical vapor deposition (PVD) chamber comprising:
- a plurality of cathode assemblies;
- an upper shield below the plurality of cathode assemblies having a shield hole to expose one of the plurality of cathode assemblies;
- and
- a lower shield below the upper shield, the lower shield having an upper end in contact with the upper shield, a lower end opposite the upper end, and a lower shield wall comprising a height “H” extending from the upper end to the lower end and a lower shield wall inner surface, wherein the lower shield wall inner surface has a straight region extending from the upper end to about 0.8H wherein the straight region is free of bends on the lower shield wall inner surface having an angle in a range of from about 0.1 degrees and about 120 degrees and in a range of from about 210 degrees and about 360 degrees.
1 more element
A physical vapor deposition (PVD) chamber comprising:
- a plurality of cathode assemblies;
- an upper shield below the plurality of cathode assemblies having a shield hole to expose one of the plurality of cathode assemblies;
- a lower shield below the upper shield, the lower shield having an upper end in contact with the upper shield, a lower end opposite the upper end, and a lower shield wall comprising a height “H” extending from the upper end to the lower end;
- and
- one or more heating elements adjacent to the lower shield.
2 more elements
A method of depositing a material layer comprising:
- placing a substrate in a PVD chamber comprising a plurality of cathode assemblies, an upper shield below the plurality of cathode assemblies having a shield hole to expose one of the plurality of cathode assemblies, and a lower shield below the upper shield, the lower shield having an upper end in contact with the upper shield, a lower end opposite the upper end, and a lower shield wall comprising a height “H” extending from the upper end to the lower end and a lower shield wall inner surface, wherein the lower shield wall inner surface has a straight region extending from the upper end to about 0.8H wherein the straight region is free of bends on the lower shield wall inner surface having an angle in a range of from about 0.1 degrees and about 120 degrees and in a range of from about 210 degrees and about 360 degrees;
- and
- heating the lower shield with one or more heating elements disposed adjacent the lower shield.
Dependencies are inferred from the claim text.