L-shaped plasma confinement ring for plasma chambers
AssigneeSilfex, Inc.
InventorsJihong CHEN, Yi SONG
Life of this patent
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Abstract
A plasma confinement ring for a plasma chamber comprises a ring-shaped element and a cylindrical element. The ring-shaped element of the plasma confinement ring surrounds a substrate support assembly in the plasma chamber and is arranged along a plane in which a substrate is arranged on the substrate support assembly. The ring-shaped element includes a plurality of orifices. The cylindrical element of the plasma confinement ring extends from an outer edge of the ring-shaped element in a direction perpendicular to the plane in which the substrate is arranged on the substrate support assembly in the plasma chamber. The plasma confinement ring is monolithic.
Claims10
A plasma confinement ring for a plasma chamber, the plasma confinement ring comprising:
- a ring-shaped element of the plasma confinement ring for the plasma chamber, the ring-shaped element surrounding a substrate support assembly in the plasma chamber and arranged along a plane in which a substrate is arranged on the substrate support assembly in the plasma chamber, the ring-shaped element including a plurality of orifices;
- and
- a cylindrical element of the plasma confinement ring for the plasma chamber, the cylindrical element extending from an outer edge of the ring-shaped element in a direction perpendicular to the plane in which the substrate is arranged on the substrate support assembly in the plasma chamber,
- wherein the plasma confinement ring is monolithic.
Dependencies are inferred from the claim text.