Metal Plating of Grids for Ion Beam Sputtering
AssigneeResearch Electro-Optics, Inc.
InventorsEric Baltz, Sam Richman, Nelson C. Turner
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Abstract
Provided herein are deposition systems utilizing coated grids in an ion deposition process which provide more predictable erosion of the coating rather than erosion of the grid itself. Further, coatings may be utilized in which the coating material does not act as a contaminant to the deposition process, thereby eliminating contamination of the sample surface due to deposition of unwanted grid material. Also provided are methods of refurbishing a coated grid by periodically replacing the coating material thus protecting the grid itself and allowing a grid to be used indefinitely.
Claims31
A deposition system comprising:
- an ion source suitable for providing a beam of selected ions, the ion source comprising at least one coated grid, the coated grids comprising:
- an electrically conductive substrate comprising a plurality of apertures extending through a thickness direction of the substrate;
- and a coating covering an outer surface of the substrate, wherein the coating is formed of a metallic or semiconducting material;
- and a deposition chamber receiving the beam of selected ions when emitted from the ion source.
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A method of generating a thin film comprising:
- providing a deposition system comprising:
- an ion source comprising at least one coated grid, the coated grids comprising:
- an electrically conductive substrate comprising a plurality of apertures extending through a thickness direction of the substrate;
- and
- a coating covering an outer surface of the substrate, wherein the coating is formed of a metallic or semiconducting material;
- a discharge chamber in fluid communication with a gas source;
- and a deposition chamber for receiving an ion beam from the ion source;
- generating a plasma in the discharge chamber by ionizing a gas from the gas source;
- establishing a positive or negative potential difference between a ground and at least one coated grid and accelerating ions from the plasma present within the discharge chamber through respective apertures of the grids, thereby forming said ion beam;
- directing said ion beam at a target provided in the deposition chamber, thereby generating sputtered target material;
- and
- depositing at least a portion of the sputtered target material on a receiving surface of a substrate provided in the deposition chamber, thereby generating said thin film.
A method of refurbishing an ion beam source comprising:
- providing a grid that has been exposed to ions within an ion source for a selected operating period, the grid comprising:
- an electrically conductive substrate comprising a plurality of apertures extending through a thickness direction of the substrate;
- and a first coating positioned an outer surface of the substrate, wherein the first coating comprises a portion at least partially eroded by ions and wherein the first coating is formed of a metallic or semiconducting material;
- removing the first coating from the electrically conductive substrate;
- and depositing a second coating on the outer surface of the substrate, wherein the second coating is formed of a metallic or semiconducting material.
Dependencies are inferred from the claim text.