Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography
AssigneeD2S, Inc.
InventorsAkira Fujimura, Thang Nguyen, Ajay Baranwal, Michael J. Meyer, Suhas Pillai
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AssigneeD2S, Inc.
InventorsAkira Fujimura, Thang Nguyen, Ajay Baranwal, Michael J. Meyer, Suhas Pillai
Estimating the term…
Methods for fracturing or mask data preparation are disclosed in which a set of single-beam charged particle beam shots is input; a calculated image is calculated using a neural network, from the set of single-beam charged particle beam shots; and a set of multi-beam shots is generated based on the calculated image, to convert the set of single-beam charged particle beam shots to the set of multi-beam shots which will produce a surface image on the surface. Methods for training a neural network include inputting a set of single-beam charged particle beam shots; calculating a set of calculated images using the set of single-beam charged particle beam shots; and training the neural network with the set of calculated images.
A method for forming a pattern on a surface using multi-beam charged particle beam lithography, the method comprising:
A method for training a neural network, the method comprising:
Dependencies are inferred from the claim text.