Apparatus for multiple charged-particle beams
AssigneeASML Netherlands B.V.
InventorsWeiming REN, Xuedong Liu, Xuerang Hu, Zong-wei Chen
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AssigneeASML Netherlands B.V.
InventorsWeiming REN, Xuedong Liu, Xuerang Hu, Zong-wei Chen
Estimating the term…
Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.
A charged particle optical system comprising:
A method of forming a plurality of probe spots on a sample, the method comprising:
Dependencies are inferred from the claim text.