Ion beam irradiation apparatus

An ion beam irradiation apparatus for irradiating a wafer with an ion beam, comprising:

• a chamber comprising an upper portion and a lower portion, the upper portion configured to irradiate the wafer with the ion beam and housing a wafer supporting mechanism configured to support the wafer, the lower portion housing a transport mechanism configured to move the wafer supporting mechanism in a substantially horizontal direction;
• and
• a partition wall disposed between the upper portion of the chamber and the lower portion of the chamber, the partition wall having:
• an aperture formed in the direction of movement of the transport mechanism and configured for moving the wafer supporting mechanism along with a coupling member coupling the wafer supporting mechanism to the transport mechanism,
• a plurality of plate members, each plate member provided independently from the upper portion and the lower portion of the chamber and independently from the other plate members, and each plate member is detachable from the upper portion and the lower portion of the chamber and detachable from the other plate members,
• wherein the transport mechanism comprises a movement guide mechanism laterally extending in the direction of movement of the transport mechanism and housed entirely within the lower portion, wherein the coupling member extends in a substantially vertical direction from the movement guide mechanism toward the aperture.