Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method
AssigneeNikon Corporation
InventorTakehisa YAHIRO
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Abstract
A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.
Claims25
A charged particle beam optical system comprising a plurality of irradiation optical systems each of which is configured to irradiate an object with a charged particle beam,
- the plurality of irradiation optical system including a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.
Dependencies are inferred from the claim text.