Sputtering Target, Method for Producing Laminated Film, Laminated Film and Magnetic Recording Medium
AssigneeJX Nippon Mining & Metals Corporation
InventorsMasayoshi Shimizu, Yasuyuki Iwabuchi, Manami Masuda
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Abstract
A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
Claims11
A sputtering target containing Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals selected from the group consisting of Cr and Ru to the content of Co is ½ or more, and wherein the sputtering target contains Nb2O5 as a metal oxide component.
A laminated film, comprising:
- a base layer containing Ru;
- and an intermediate layer formed on the base layer, the intermediate layer containing Co and one or more metals selected from the group consisting of Cr and Ru as metal components, the intermediate layer having a molar ratio of the content of the one or more metals selected from the group consisting of Ru and Co to the content of Co of ½ or more;
- and a magnetic layer formed on the intermediate layer, the magnetic layer containing Co and Pt as metal components, wherein the intermediate layer contains Nb2O5 as a metal oxide component.
Dependencies are inferred from the claim text.