Optimized electromigration analysis

A non-transitory storage medium having instructions stored thereon that, when executed by one or more processing devices, cause the one or more processing devices to perform actions comprising:

• providing a first layout of a circuit, the first layout comprising a power source, a voltage rail connected to the power source, a first plurality of circuit components, and a net comprising one or more metal lines, wherein:
• the voltage rail is connected to both the power source and first terminals of the first plurality of circuit components;
• and
• the net is connected to second terminals of the first plurality of circuit components;
• determining one or more electrical properties of the first layout;
• providing a second layout by modifying the net in the first layout;
• and
• determining one or more electrical properties of the second layout based on the one or more electrical properties of the first layout;
• and
• transferring a pattern of the second layout to a mask to be used in the manufacturing of the circuit on a substrate.

A computer system, comprising:

• a memory configured to store instructions;
• and
• a processor, that when executing instructions, is configured to perform operations, the operations comprising:
• providing a first layout of the circuit, wherein the first layout comprises a power source, a first plurality of circuit components, and a first net comprising one or more metal lines that comprise output terminals, wherein the first plurality of circuit components are connected to the output terminals of the net;
• determining one or more electrical properties of the first layout;
• providing a second layout by modifying at least one of the one or more metal lines of the net in the first layout;
• providing a third layout by replacing the first plurality of circuit components with a second plurality of circuit components in the second layout, wherein the second circuit components are connected to the output terminals of the modified net;
• determining one or more electrical properties of the third layout;
• and
• transferring a pattern of the second layout to a mask based on the one or more electrical properties of the third layout.