Lithographic apparatus, lithographic projection apparatus and device manufacturing method

A lithographic apparatus comprising:

• an illumination system configured to condition a radiation beam;
• a support constructed to support a patterning device, the patterning device being capable of imparting to the radiation beam a pattern in its cross-section to form a patterned radiation beam;
• a projection system configured to project the patterned radiation beam onto a substrate;
• the projection system comprising a plurality of optical elements,
• a sensor frame,
• a first position measurement system configured to measure a position of at least one of the plurality of optical elements relative to the sensor frame, wherein the position measurement system comprises at least one sensor adapted to monitor an optical element, which sensor comprises at least one sensor element which is mounted to the sensor frame,
• a sensor frame support configured to support the sensor frame on a reference,
• a force measurement device which is adapted to generate force measurement data relating to a force which is exerted on the sensor frame by the sensor frame support,
• a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control the relative position of the substrate and the patterned radiation beam based on at least the force measurement data.

A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate, comprising:

• a projection system configured to project a patterned radiation beam onto a substrate;
• the projection system comprising a plurality of optical elements,
• a sensor frame,
• a first position measurement system configured to measure a position of at least one of the plurality of optical elements relative to the sensor frame, wherein the position measurement system comprises at least one sensor adapted to monitor an optical element, which sensor comprises at least one sensor element which is mounted to the sensor frame,
• a sensor frame support configured to support the sensor frame on a reference,
• a force measurement device which is adapted to generate force measurement data relating to a force which is exerted on the sensor frame by the sensor frame support,
• a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control the relative position of the substrate and the patterned radiation beam based on at least the force measurement data.

A method of manufacturing a device, the method comprising transferring a pattern from a patterning device onto a substrate using a lithographic apparatus comprising:

• a projection system configured to project a patterned radiation beam onto a substrate;
• the projection system comprising a plurality of optical elements,
• a sensor frame,
• a first position measurement system configured to measure a position of at least one of the plurality of optical elements relative to the sensor frame, wherein the position measurement system comprises at least one sensor adapted to monitor an optical element, which sensor comprises at least one sensor element which is mounted to the sensor frame,
• a sensor frame support configured to support the sensor frame on a reference,
• a force measurement device which is adapted to generate force measurement data relating to a force which is exerted on the sensor frame by the sensor frame support,
• a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control the relative position of the substrate and the patterned radiation beam based on at least the force measurement data.

A method of manufacturing a device, the method comprising projecting a patterned radiation beam onto a substrate, comprising the step of using a lithographic apparatus comprising:

• a projection system configured to project a patterned radiation beam onto a substrate;
• the projection system comprising a plurality of optical elements,
• a sensor frame,
• a first position measurement system configured to measure a position of at least one of the plurality of optical elements relative to the sensor frame, wherein the position measurement system comprises at least one sensor adapted to monitor an optical element, which sensor comprises at least one sensor element which is mounted to the sensor frame,
• a sensor frame support configured to support the sensor frame on a reference,
• a force measurement device which is adapted to generate force measurement data relating to a force which is exerted on the sensor frame by the sensor frame support,
• a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control the relative position of the substrate and the patterned radiation beam based on at least the force measurement data.