Substrate table, immersion lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Ana Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
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Abstract
A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
Claims20
A substrate table for an immersion lithographic apparatus, comprising:
- a recess, configured to receive a substrate of a given size, the recess having a support region to support a lower surface of the substrate and an edge configured to be adjacent the edge of a substrate when it is supported by the support region;
- and
- a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess,
- wherein the fluid extraction system is configured such that, in the absence of liquid, the rate of flow of fluid extracted from a localized section of the gap having a given length is greater than the rate of flow of fluid extracted from another section of the gap having the same length.
A substrate table for an immersion lithographic apparatus, comprising:
- a recess, configured to receive a substrate of a given size, the recess having a support region to support a lower surface of the substrate and an edge configured to be adjacent the edge of a substrate when it is supported by the support region;
- and
- a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess,
- wherein the fluid extraction system comprises a first duct, opening into the gap, configured to extract fluid from the gap substantially all round the substrate and a second duct, opening into the gap, configured to extract fluid from a localized section of the gap, and
- the smallest dimension of the cross-section of the first duct is smaller than the smallest dimension of the cross-section of the second duct at the point at which the first and second ducts open into the gap.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a fluid provided in a space adjacent the substrate, wherein the substrate is supported in a recess on a substrate table;
- and
- extracting fluid from a gap between an edge of the recess and the edge of the substrate such that in the absence of liquid the rate of flow of fluid extracted from a localized section of the gap having a given length is greater than the rate of flow of fluid extracted from another section of the gap having the same length.
Dependencies are inferred from the claim text.