Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrate

A substrate processing method, comprising:

• supplying a diluting liquid on a surface of a substrate and forming a liquid puddle of the diluting liquid;
• bringing, by moving a nozzle having a liquid contact surface facing the surface of the substrate and a discharge hole which is opened at the liquid contact surface and through which a processing liquid is discharged, the liquid contact surface into contact with the liquid puddle of the diluting liquid, and forming a liquid puddle of a mixed solution of the diluting liquid and the processing liquid by discharging the processing liquid from the discharge hole;
• rotating the substrate at a first rotation speed which allows the mixed solution located at a region facing an inner side than an edge of the liquid contact surface to stay between the liquid contact surface and the surface of the substrate and allows the mixed solution located at a region facing an outer side than the edge of the liquid contact surface to be diffused toward an edge of the substrate;
• rotating the substrate at a second rotation speed smaller than the first rotation speed after the substrate is rotated at the first rotation speed;
• and
• moving the nozzle toward the edge of the substrate while discharging the processing liquid from the discharge hole in a state that the substrate is rotated at the second rotation speed.