Resist composition and patterning process

An amine compound having the formula (A′):

• wherein R1 is hydroxyl, C1-C6 alkyl, C1-C6 alkoxy group, C2-C6 acyloxy group, fluorine, chlorine, bromine, amino, —NR1A—C(═O)—R1B, or —NR1A—C(═O)—O—R1B, R1A is hydrogen or a C1-C6 alkyl group, R1B is a C1-C6 alkyl, C2-C8 alkenyl, C6-C12 aryl or C7-C13 aralkyl group,
• X is a C1-C20 divalent hydrocarbon group which may contain at least one moiety selected from ester bond and ether bond,
• the ring R3 is a C4-C6 heterocycle formed with the nitrogen atom, which may contain an ether bond, thioether bond, —N(R4)—, carbonyl group or sulfonyl group, R4 is hydrogen, C1-C6 alkyl, C2-C6 alkenyl, C2-C8 acyl, C7-C20 aralkyl or C1-C16 alkoxycarbonyl group,
• m and n are independently an integer meeting 1≤m≤5, 0≤n≤4 and 1≤m+n≤5.