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US 2020/0049883 A1Published application
Method of Making a Metal Grating in a Waveguide and Device Formed
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJui Hsieh Lai, Ying-Hao Kuo
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Abstract
A method of making a grating in a waveguide includes forming a waveguide material over a substrate, the waveguide material having a thickness less than or equal to about 100 nanometers (nm). The method further includes forming a photoresist over the waveguide material and patterning the photoresist. The method further includes forming a first set of openings in the waveguide material through the patterned substrate and filling the first set of openings with a metal material.
Claims20
A structure comprising:
- a substrate comprising active circuitry and an interconnect structure, the interconnect structure being disposed over the active circuitry, the substrate having a planar major surface;
- a first grating comprising a plurality of first metal features on the planar major surface of the substrate, the first metal features having a first pitch;
- a second grating comprising a plurality of second metal features on the planar major surface of the substrate, the second metal features having a second pitch, the second pitch being different from the first pitch;
- and
- a waveguide material layer surrounding the first metal features and the second metal features.
2 more elements
A structure comprising:
- a substrate comprising active circuitry and an interconnect structure, the interconnect structure being disposed over the active circuitry;
- a first waveguide over the substrate, the first waveguide extending in a first direction along a major surface of the substrate;
- a second waveguide over the substrate, the second waveguide extending in a second direction along the major surface of the substrate, the second direction being different from the first direction;
- a third waveguide over the substrate, the third waveguide extending in a third direction along the major surface of the substrate, the third direction being different from the first direction;
- and
- a grating at an intersection of the first waveguide, the second waveguide, and the third waveguide, the grating comprising a plurality of metal features, a first subset of the metal features repeating with a first period, a second subset of the metal features repeating with a second period, the second period being less than the first period.
3 more elements
A structure comprising:
- a substrate comprising active circuitry and an interconnect structure, the interconnect structure being disposed over the active circuitry, the substrate having a planar major surface;
- a first waveguide over the substrate, the first waveguide extending in a first direction along a major surface of the substrate;
- a second waveguide over the substrate, the second waveguide extending in a second direction along the major surface of the substrate, the second direction being different from the first direction;
- a third waveguide over the substrate, the third waveguide extending in a third direction along the major surface of the substrate, the third direction being different from the first direction;
- a first grating at an intersection of the first waveguide and the second waveguide, the first grating comprising a plurality of first metal features on the planar major surface of the substrate, the first metal features having a first pitch;
- and
- a second grating at an intersection of the first waveguide and the third waveguide, the second grating comprising a plurality of second metal features on the planar major surface of the substrate, the second metal features having a second pitch, the second pitch being different from the first pitch.
4 more elements
Dependencies are inferred from the claim text.