Chemical vapor deposition tool for preventing or suppressing arcing
AssigneeLam Research Corporation
InventorsYukinori SAKIYAMA, Karl Frederick LEESER, Vincent BURKHART
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Abstract
A Chemical Vapor Deposition (CVD) tool that suppresses or altogether eliminates arcing between a substrate pedestal and substrate. The CVD tool includes a Direct Current (DC) bias control system arranged to maintain a substrate pedestal provided in a processing chamber at a same or substantially the same DC bias voltage as developed by a plasma in the processing chamber. By maintaining the substrate pedestal and the substrate having the same potential as the plasma at the same or substantially the same voltage potential, arcing is suppressed or altogether eliminated.
Claims23
A Chemical Vapor Deposition (CVD) tool, comprising
- a processing chamber;
- a substrate pedestal for supporting a substrate within the processing chamber;
- a shower head positioned within the processing chamber, the shower head arranged to dispense gas that is turned into a plasma within the processing chamber in response to a Radio Frequency (RF) potential, the plasma developing a DC bias voltage;
- and
- a Direct Current (DC) bias control system arranged to maintain the substrate pedestal at a same or substantially the same DC bias voltage as the DC bias voltage developed by the plasma in the processing chamber.
The CVD tool of claim 14, wherein the DC bias control system is further arranged to maintain the two or more substrate pedestals at the same or substantially the same DC bias voltage as the plasma in the processing chamber.
A Chemical Vapor Deposition (CVD) tool comprising a Direct Current (DC) bias control system arranged to maintain a substrate pedestal provided in a processing chamber at a same or substantially the same DC bias voltage as developed by a plasma in the processing chamber.
Dependencies are inferred from the claim text.